Resolution Enhancement Techniques in Optical Lithography by Alfred Kwok-Kit Wong

The acceleration of integrated circuit miniaturization is challenging lithographers to push the limits of optical lithography by ever more precise engineering and innovations. As IC device dimensions grow smaller, circuits outpace the introduction of shorter exposure wavelengths and higher numerical aperture lenses, increasing the importance of resolution enhancement techniques. This work summarizes the latest enhancement research that has matured since the 1980s. Theoretical and practical aspects of commonly used techniques are discussed, serving students and practising lithographers alike. #Conoptical Imaging And Resolution; Modified Illumination; Optical Proximity Correction; Alternating Phase-Shifting Mask; Attenuated Phase-Shifting Mask; Selecting Appropriate Rets; Second Generation Rets; Concluding Remarks.
`Author(s) :` Alfred Kwok-Kit Wong	`Format :` Paperback Book
`ISBN-10 :` 0819439959	`ISBN-13 :` 9780819439956
`RRP :` £33.50	`Best available price :` £32.47 / $54.00
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Product Details:

Series Title : Spie Press Monograph

Country Publication : United States

Publication Date : 31/03/2001

Publisher : SPIE Press

Page Length : 214mm

Page Size : 230mm