Ion Implantation Technology by Karen J. Kirkby & Russell M. Gwilliam & Andy Smith

All papers were peer-reviewed. Ion implantation is used to manufacture semiconductor devices. Materials properties are changed by bombarding wafers with atoms, which are accelerated in an ion implanter. This is the premier world conference for the presentation of the latest advances in ion implantation, from the fundamentals of ion-solid interactions to manufacturing implant equipment. Topics included are: doping processes in semiconductors; plasma immersion ion implantation and plasma doping; materials - novel techniques and applications; implant technology; process control and yield; metrology; as well as machines.